The NSW Node of ANFF is based at the University of New South Wales, operating within a 600m2 laboratory complex providing cleanrooms with particle counts equivalent to ISO5, ISO6 and ISO7.
The core area of expertise for ANFF-NSW is nanoelectronics, with both Si-MOS and GaAs devices with sub-50nm feature sizes routinely produced using the Node’s suite of high resolution EBL systems. The full range of research disciplines regularly supported by ANFF-NSW is broad, encompassing quantum computing, biomedical devices, nanophotonics, medical detectors and photovoltaics. ANFF-NSW also has a strong process engineering team available to develop and deliver one-on-one nanofabrication training programs to suit researchers’ needs, and to perform process development work on behalf of researchers.
- high resolution electron-beam lithography
- nanoelectronics (Si MOS and GaAs)
- semiconductor device processing
- three high resolution EBL systems, including the flagship Raith 150TWO
- UV lithography equipment
- a range of deposition systems and etching tools
- high temperature silicon oxidation, diffusion and annealing furnaces
- wet chemical process lines
- a suite of metrology tools
- device packaging and bonding tools